快速退火爐RTP設(shè)備
AG Heatpulse 4100 Rapid Thermal Processor
設(shè)備型號(hào): AG Heatpulse 4100/4100S
傳片方式： Automatic Single wafer
設(shè)備狀態(tài): Complete Fully Refurbished
襯底材料：Si/SiC/GaAs/InP
材料尺寸：4/5/6/圓片
測(cè)溫方式：熱電偶（200-900℃）或者高溫計(jì)測(cè)溫（500-1250℃）
升溫速率：10-100℃/S，Susceptor Box: 0-20℃/S
氣路配置： 2 gas lines with 2 MFC. N2,O2 or Ar(可擴(kuò)展，最多4路氣體MFC)
恒溫時(shí)間：1-600S設(shè)定
溫度重復(fù)性: + 7°C or better at 1150°C wafer to wafer. (Repetition specifications are based on a 100-wafer set.)
溫度均勻性: + 10°C across an 6-inch wafer at 1150°C. (This is a 1-sigma deviation from 100-angstrom oxide uniformity.) For a titanium silicidation process, no more than 1.5 percent increase to uniformity during the first anneal at 650 – 700°C.
選配功能:
*全新機(jī)械手及模塊
*全新氧氣分析儀（0-10PPM）
* EAP/GEM/SECS II 功能(Software)
*全新氣體管路最多增加至4路MFC
*全新SiC/GaAs/InP及透明材料傳動(dòng)模塊
*全新Susceptor Box
*全新低溫TC測(cè)溫控制系統(tǒng)(200-900℃)
設(shè)備硬件標(biāo)準(zhǔn)配置清單 | |||||
序號(hào) | 配置名稱(chēng) | 配置規(guī)格 | 配置數(shù)量 | 備注 | |
1 | 快速退火爐主機(jī) | AG Heatpulse 4100 | 1套 | NEW | |
2 | 設(shè)備金屬腔體 | OEM | 1套 | NEW | |
3 | 設(shè)備氣路控制系統(tǒng) | OEM | 1套 | NEW Parker調(diào)壓閥/Fujikin 氣動(dòng)閥 | |
4 | AC及DC電源組件 | OEM | 1套 | NEW | |
5 | 機(jī)械手Robot | ATM | 1套 | Refurbished | |
6 | 控制器Controller | ESC | 1套 | Refurbished | |
7 | 圖形界面操作系統(tǒng) | 1套 | NEW | ||
8 | 工控主機(jī)/顯示器 | 1套 | NEW | ||
設(shè)備易損件隨貨標(biāo)準(zhǔn)配置清單 | |||||
序號(hào) | 配置名稱(chēng) | 配置規(guī)格 | 配置數(shù)量 | 備注 | |
1 | 6英寸石英工藝腔體 | OEM | 1 | NEW | |
2 | 6英寸石英工藝支架 | OEM | 1 | NEW | |
